File:OpcedPhotomask.png
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Summary
| Description | English: A realistic photomask. It is obtained by taking a polygon layout we desire to have on the wafer, adding to it assist features, and applying en:optical proximity correction. |
| Date | (UTC) |
| Source | Own work |
| Author | LithoGuy |
Licensing
I, the copyright holder of this work, hereby publish it under the following licenses:
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
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- attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 18:50, 11 February 2011 | | 2,079 × 2,077 (40 KB) | LithoGuy | {{Information |Description ={{en|1=A realistic photomask. It is obtained by taking a polygon layout we desire to have on the wafer, adding to it assist features, and applying en:optical proximity correction.}} |Source ={{own}} |Author |
File usage
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Global file usage
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- Usage on kk.wikipedia.org
- Usage on uk.wikipedia.org
