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File:28 nm pitch aggressive multipatterning.png

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Summary

Description
English: At ~30 nm pitch, both immersion DUV and EUV approaches require multiple patterning (in this case, four exposures and three exposures, respectively). DUV faces optical resolution limits, while EUV faces stochastic defect issues[1] and illumination constraints.[2][3]
Date
Source Own work
Author Guiding light

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References

  1. ↑ S. Kang et al., Proc. SPIE 11611, 1161129 (2021).
  2. ↑ D. Rio et al., Proc. SPIE 11609, 116090T (2021).
  3. ↑ J-H. Franke et al., Proc. SPIE 11517, 1151716 (2020).

Captions

At ~30 nm pitch, both DUV and EUV approaches require multiple patterning

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13 March 2021

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current21:20, 14 March 2021Thumbnail for version as of 21:20, 14 March 2021869 × 552 (7 KB)Guiding lightpitch
21:15, 14 March 2021Thumbnail for version as of 21:15, 14 March 2021869 × 552 (20 KB)Guiding lightpitch
16:25, 13 March 2021Thumbnail for version as of 16:25, 13 March 2021869 × 552 (20 KB)Guiding lightcorrected label of one part
16:17, 13 March 2021Thumbnail for version as of 16:17, 13 March 2021869 × 552 (20 KB)Guiding lightUploaded own work with UploadWizard

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